Doping is the process of intentionally introducing impurities or foreign atoms into a semiconductor material to alter its electrical properties. The primary purpose of doping is to increase the electrical conductivity of the semiconductor material, which is crucial for the functioning of electronic devices.In a pure semiconductor, such as silicon or germanium, the number of electrons negatively charged particles is equal to the number of holes positively charged vacancies . These semiconductors are called intrinsic semiconductors. However, their electrical conductivity is relatively low, which limits their usefulness in electronic devices.Doping involves adding a small amount of impurity atoms, typically from elements in the same group of the periodic table, to the semiconductor material. There are two types of doping: n-type and p-type.1. N-type doping: In n-type doping, impurity atoms with more valence electrons than the semiconductor atoms are added. For example, adding phosphorus with 5 valence electrons to silicon with 4 valence electrons creates an n-type semiconductor. The extra valence electrons from the impurity atoms are loosely bound and can easily move within the material, increasing the number of free electrons and thus the electrical conductivity.2. P-type doping: In p-type doping, impurity atoms with fewer valence electrons than the semiconductor atoms are added. For example, adding boron with 3 valence electrons to silicon with 4 valence electrons creates a p-type semiconductor. The impurity atoms create holes, or vacancies, where an electron is missing. These holes can move within the material, increasing the number of free holes and thus the electrical conductivity.In summary, doping increases the electrical conductivity of semiconductor materials by increasing the number of charge carriers free electrons in n-type and holes in p-type semiconductors . This enhanced conductivity is essential for the efficient functioning of electronic devices, such as transistors, diodes, and integrated circuits.